{"id":4686,"date":"2023-09-08T14:32:34","date_gmt":"2023-09-08T12:32:34","guid":{"rendered":"https:\/\/measline.com\/?post_type=project&#038;p=4686"},"modified":"2025-12-02T10:35:14","modified_gmt":"2025-12-02T09:35:14","slug":"compact-sputtering-system-for-surface-metallization","status":"publish","type":"project","link":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/","title":{"rendered":"Compact PVD and sputtering system for surface metallization\u00a0"},"content":{"rendered":"<p>[et_pb_section fb_built=&#8221;1&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; background_color=&#8221;rgba(0,0,0,0.05)&#8221; custom_margin=&#8221;0px|0px|0px|0px|false|false&#8221; custom_padding=&#8221;0px|0px|0px|0px|false|false&#8221; locked=&#8221;off&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_row column_structure=&#8221;1_2,1_2&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; custom_margin=&#8221;0px||0px||true|false&#8221; custom_padding=&#8221;11px||3px||false|false&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_column type=&#8221;1_2&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_button button_url=&#8221;@ET-DC@eyJkeW5hbWljIjp0cnVlLCJjb250ZW50IjoicG9zdF9saW5rX3VybF9wYWdlIiwic2V0dGluZ3MiOnsicG9zdF9pZCI6IjQ0MzkifX0=@&#8221; button_text=&#8221;Back to all projects&#8221; _builder_version=&#8221;4.22.1&#8243; _dynamic_attributes=&#8221;button_url&#8221; _module_preset=&#8221;default&#8221; custom_button=&#8221;on&#8221; button_text_color=&#8221;#225500&#8243; button_border_width=&#8221;0px&#8221; button_icon=&#8221;&#x4a;||divi||400&#8243; global_colors_info=&#8221;{}&#8221;][\/et_pb_button][\/et_pb_column][et_pb_column type=&#8221;1_2&#8243; _builder_version=&#8221;4.17.0&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_button button_url=&#8221;@ET-DC@eyJkeW5hbWljIjp0cnVlLCJjb250ZW50IjoicG9zdF9saW5rX3VybF9wYWdlIiwic2V0dGluZ3MiOnsicG9zdF9pZCI6IjQ1MTMifX0=@&#8221; button_text=&#8221;Thin layer deposition systems&#8221; _builder_version=&#8221;4.22.1&#8243; _dynamic_attributes=&#8221;button_url&#8221; _module_preset=&#8221;default&#8221; custom_button=&#8221;on&#8221; button_text_color=&#8221;#225500&#8243; button_border_width=&#8221;0px&#8221; button_icon=&#8221;&#x4a;||divi||400&#8243; global_colors_info=&#8221;{}&#8221;][\/et_pb_button][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=&#8221;1&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; custom_padding=&#8221;41px|||||&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_row column_structure=&#8221;1_2,1_2&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_column type=&#8221;1_2&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_image src=&#8221;https:\/\/measline.com\/\/wp-content\/uploads\/2022\/01\/1-fragment.jpg&#8221; title_text=&#8221;1 fragment&#8221; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; width=&#8221;63%&#8221; module_alignment=&#8221;center&#8221; global_colors_info=&#8221;{}&#8221;][\/et_pb_image][\/et_pb_column][et_pb_column type=&#8221;1_2&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_text _builder_version=&#8221;4.22.1&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;]<\/p>\n<h1><strong>Compact PVD and sputtering system for surface metallization\u00a0<\/strong><\/h1>\n<p>[\/et_pb_text][et_pb_divider color=&#8221;#215500&#8243; divider_weight=&#8221;2px&#8221; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; custom_margin=&#8221;-23px||6px||false|false&#8221; global_colors_info=&#8221;{}&#8221;][\/et_pb_divider][et_pb_text _builder_version=&#8221;4.22.1&#8243; _module_preset=&#8221;default&#8221; custom_padding=&#8221;||0px|||&#8221; global_colors_info=&#8221;{}&#8221;]<\/p>\n<p class=\"Standard\" style=\"text-align: justify;\">A compact vacuum sputtering system for surface metalization consisting of three chambers enables the application of layers by thermal and ion sputtering. The device is equipped with a container for transferring samples in controlled atmosphere conditions between the sputtering machine and the glove box or for storing them in controlled atmosphere conditions.<\/p>\n<p>[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=&#8221;1&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; background_color=&#8221;rgba(0,0,0,0.05)&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_row column_structure=&#8221;2_3,1_3&#8243; admin_label=&#8221;Wiersz&#8221; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_column type=&#8221;2_3&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_text _builder_version=&#8221;4.22.1&#8243; _module_preset=&#8221;default&#8221; custom_margin=&#8221;-50px||||false|false&#8221; custom_padding=&#8221;0px||||false|false&#8221; global_colors_info=&#8221;{}&#8221;]<\/p>\n<div>\n<h3 class=\"Standard\">The most significant device features:<\/h3>\n<p><span><\/span><\/p>\n<p><span><\/span><\/p>\n<\/div>\n<div>\n<ul>\n<li class=\"Standard\">Intended for layer deposition with the PVD physical vapor deposition technique<\/li>\n<li class=\"Standard\">Sample loading chamber used for insertion and removal of samples to the deposition chamber in a protective gas shield<\/li>\n<li class=\"Standard\">A sample loaded into a container, e.g., in a glove box in a protective gas atmosphere, can be transferred to the sputtering chamber under strictly controlled conditions using<a href=\"https:\/\/measline.com\/index.php\/en-gb\/transfers\/\"> linear transfer<\/a><\/li>\n<li class=\"Standard\">Thermal deposition chamber with 1-3 thermal evaporators<\/li>\n<li class=\"Standard\">Sputter deposition chamber equipped with a magnetron<\/li>\n<li class=\"Standard\">Chambers made in HV standard<\/li>\n<li class=\"Standard\">Analysis of the thickness of the applied layers with a resolution of sub nm using a quartz balance<\/li>\n<li class=\"Standard\">Sample holder adapted to substrates with maximum dimensions of 50&#215;50. For smaller substrates, masks cut from steel sheets with a thickness of 0.1 mm to 0.5 mm can be used. Masks provide stabilization of the position of smaller substrates during transfer and rotation. The arrangement of holes in the mask can be adapted to the substrates.<\/li>\n<\/ul>\n<\/div>\n<p>[\/et_pb_text][\/et_pb_column][et_pb_column type=&#8221;1_3&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_gallery gallery_ids=&#8221;1535,1884,1887&#8243; fullwidth=&#8221;on&#8221; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; auto=&#8221;on&#8221; auto_speed=&#8221;5000&#8243; global_colors_info=&#8221;{}&#8221;][\/et_pb_gallery][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=&#8221;1&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; custom_padding=&#8221;30px||||false|false&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_row _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; custom_padding=&#8221;0px||0px||false|false&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_column type=&#8221;4_4&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_text _builder_version=&#8221;4.22.1&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;]<\/p>\n<div class=\"dataTables_scrollHead\">\n<div class=\"dataTables_scrollHeadInner\">\n<h3>Specification:<\/h3>\n<table border=\"1\" style=\"border-collapse: collapse; width: 100%; height: 642px;\">\n<tbody>\n<tr style=\"height: 24px;\">\n<td style=\"width: 50%; height: 24px;\"><strong>Loading chamber<\/strong><\/td>\n<td style=\"width: 50%; height: 24px;\"><\/td>\n<\/tr>\n<tr style=\"height: 48px;\">\n<td style=\"width: 50%; height: 48px;\">Pumping down the chamber<\/td>\n<td style=\"width: 50%; height: 48px;\">with a dry pump, below 0.1 mbar in 5 minutes<\/td>\n<\/tr>\n<tr style=\"height: 80px;\">\n<td style=\"width: 50%; height: 80px;\">Vacuum measurement<\/td>\n<td style=\"width: 50%; height: 80px;\">\n<p align=\"justify\">using a Pirani head integrated with a membrane head in the range from 1\u221910\u02c9\u00b3 mbar to atmospheric pressure<\/p>\n<\/td>\n<\/tr>\n<tr style=\"height: 10px;\">\n<td style=\"width: 50%; height: 10px;\"><strong>Thermal deposition chamber<\/strong><\/td>\n<td style=\"width: 50%; height: 10px;\">\n<p align=\"justify\">\n<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 50%; height: 24px;\">Thermal transfer source<\/td>\n<td style=\"width: 50%; height: 24px;\">\n<p>basket-shaped crucibles with thermal shields and shutters, with the possibility of measuring and stabilizing the temperature of the filament<\/p>\n<p>boat-shaped tungsten crucible with a shutter<\/p>\n<\/td>\n<\/tr>\n<tr style=\"height: 10px;\">\n<td style=\"height: 10px; width: 50%;\">Tungsten crucible supply<\/td>\n<td style=\"height: 10px; width: 50%;\">up to 200 A<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 50%; height: 24px;\">Ensuring the uniformity of layers<\/td>\n<td style=\"width: 50%; height: 24px;\">\n<p align=\"justify\">use of a rotary table<\/p>\n<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"height: 24px; width: 50%;\">Temperature of samples during deposition<\/td>\n<td style=\"height: 24px; width: 50%;\">stabilized in the range from room temperature to 400\u00b0C<\/td>\n<\/tr>\n<tr style=\"height: 80px;\">\n<td style=\"width: 50%; height: 80px;\">Pump system<\/td>\n<td style=\"width: 50%; height: 80px;\">\n<p align=\"left\">turbomolecular with a pumping rate not less than 60l\/s<\/p>\n<\/td>\n<\/tr>\n<tr style=\"height: 56px;\">\n<td style=\"width: 50%; height: 56px;\">Vacuum measurement<\/td>\n<td style=\"width: 50%; height: 56px;\">\n<p align=\"justify\">using an ionization head with a hot cathode.<\/p>\n<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"height: 24px; width: 50%;\"><strong>Sputtering chamber<\/strong><\/td>\n<td style=\"height: 24px; width: 50%;\"><\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 50%; height: 24px;\">Sputtering source<\/td>\n<td style=\"width: 50%; height: 24px;\">magnetron 2&#8243;<br \/>It is possible to replace it with a 1&#8243; magnetron<\/td>\n<\/tr>\n<tr style=\"height: 56px;\">\n<td style=\"height: 56px; width: 50%;\">Magnetron power supply<\/td>\n<td style=\"height: 56px; width: 50%;\">\n<p align=\"justify\">DC 600W<\/p>\n<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 50%; height: 24px;\">Gas dosing valve<\/td>\n<td style=\"width: 50%; height: 24px;\">manual<\/td>\n<\/tr>\n<tr style=\"height: 24px;\">\n<td style=\"width: 50%; height: 24px;\">Ensuring the uniformity of layers<\/td>\n<td style=\"width: 50%; height: 24px;\">\n<p align=\"justify\">use of a rotary table<\/p>\n<\/td>\n<\/tr>\n<tr style=\"height: 30px;\">\n<td style=\"width: 50%; height: 30px;\">Temperature of samples during deposition<\/td>\n<td style=\"width: 50%; height: 30px;\">stabilized in the range from room temperature to 400\u00b0C<\/td>\n<\/tr>\n<tr style=\"height: 80px;\">\n<td style=\"width: 50%; height: 80px;\">Vacuum measurement<\/td>\n<td style=\"width: 50%; height: 80px;\">\n<p align=\"justify\">using a Pirani head integrated with a membrane head in the range from 1\u221910\u02c9\u00b3 mbar to atmospheric pressure<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div><\/div>\n<div>\n<ul><\/ul>\n<\/div>\n<div>\n<ul><\/ul>\n<\/div>\n<\/div>\n<\/div>\n<p>[\/et_pb_text][\/et_pb_column][\/et_pb_row][et_pb_row _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; locked=&#8221;off&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_column type=&#8221;4_4&#8243; _builder_version=&#8221;4.16&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;][et_pb_text _builder_version=&#8221;4.22.1&#8243; _module_preset=&#8221;default&#8221; global_colors_info=&#8221;{}&#8221;]<\/p>\n<p>See also other thin-layer deposition systems:<br \/><a href=\"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-lpnw01\/\" target=\"_blank\" rel=\"noopener\">Compact PVD system LPNW01<\/a> for thermal deposition of thin layers<br \/><a href=\"https:\/\/measline.com\/index.php\/project\/kompaktowa-napylarka\/\"><\/a><a href=\"https:\/\/measline.com\/index.php\/en-gb\/project\/pvds-700-coating-deposition-system\/\" target=\"_blank\" rel=\"noopener\">PVDS 700 Coating deposition system<\/a> for layer deposition with the PVD technique<br \/><span style=\"font-size: 14px;\"><a href=\"https:\/\/measline.com\/index.php\/en-gb\/project\/magnetron-system-for-coating-deposition-mcs-787\/\" target=\"_blank\" rel=\"noopener\">Magnetron system for coating deposition MCS 787<\/a> equipped with up to four magnetron sources.<\/span><\/p>\n<p>&nbsp;<\/p>\n<p><span><\/span><\/p>\n<p><span><\/span><\/p>\n<p>[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section]<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Compact PVD and sputtering system for surface metallization\u00a0A compact vacuum sputtering system for surface metalization consisting of three chambers enables the application of layers by thermal and ion sputtering. The device is equipped with a container for transferring samples in controlled atmosphere conditions between the sputtering machine and the glove box or for storing them [&hellip;]<\/p>\n","protected":false},"author":2,"featured_media":1480,"comment_status":"open","ping_status":"closed","template":"","meta":{"_et_pb_use_builder":"on","_et_pb_old_content":"","_et_gb_content_width":"","footnotes":""},"project_category":[],"project_tag":[],"class_list":["post-4686","project","type-project","status-publish","has-post-thumbnail","hentry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.4 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Compact sputtering system for surface metallization - Measline projects<\/title>\n<meta name=\"description\" content=\"The sputtering system for surface metallization, consisting of three chambers enables the application of layers by thermal and ion sputtering.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/\" \/>\n<meta property=\"og:locale\" content=\"pl_PL\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Compact sputtering system for surface metallization - Measline projects\" \/>\n<meta property=\"og:description\" content=\"The sputtering system for surface metallization, consisting of three chambers enables the application of layers by thermal and ion sputtering.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/\" \/>\n<meta property=\"og:site_name\" content=\"Measline\" \/>\n<meta property=\"article:modified_time\" content=\"2025-12-02T09:35:14+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/measline.com\/wp-content\/uploads\/2021\/12\/1-fragment-e1641221096880.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"1039\" \/>\n\t<meta property=\"og:image:height\" content=\"903\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Szacowany czas czytania\" \/>\n\t<meta name=\"twitter:data1\" content=\"5 minut\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/\",\"url\":\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/\",\"name\":\"Compact sputtering system for surface metallization - Measline projects\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/measline.com\\\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/#primaryimage\"},\"image\":{\"@id\":\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/measline.com\\\/wp-content\\\/uploads\\\/2021\\\/12\\\/1-fragment-e1641221096880.jpg\",\"datePublished\":\"2023-09-08T12:32:34+00:00\",\"dateModified\":\"2025-12-02T09:35:14+00:00\",\"description\":\"The sputtering system for surface metallization, consisting of three chambers enables the application of layers by thermal and ion sputtering.\",\"breadcrumb\":{\"@id\":\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/#breadcrumb\"},\"inLanguage\":\"pl-PL\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"pl-PL\",\"@id\":\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/#primaryimage\",\"url\":\"https:\\\/\\\/measline.com\\\/wp-content\\\/uploads\\\/2021\\\/12\\\/1-fragment-e1641221096880.jpg\",\"contentUrl\":\"https:\\\/\\\/measline.com\\\/wp-content\\\/uploads\\\/2021\\\/12\\\/1-fragment-e1641221096880.jpg\",\"width\":1039,\"height\":903,\"caption\":\"Kompaktowa napylarka do metalizacji powierzchni\"},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\\\/\\\/measline.com\\\/index.php\\\/en-gb\\\/project\\\/compact-sputtering-system-for-surface-metallization\\\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Strona g\u0142\u00f3wna\",\"item\":\"https:\\\/\\\/measline.com\\\/index.php\\\/pl\\\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Projekty\",\"item\":\"https:\\\/\\\/measline.com\\\/index.php\\\/project\\\/\"},{\"@type\":\"ListItem\",\"position\":3,\"name\":\"Compact PVD and sputtering system for surface metallization\u00a0\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\\\/\\\/measline.com\\\/#website\",\"url\":\"https:\\\/\\\/measline.com\\\/\",\"name\":\"Measline\",\"description\":\"Advanced solutions\",\"publisher\":{\"@id\":\"https:\\\/\\\/measline.com\\\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\\\/\\\/measline.com\\\/?s={search_term_string}\"},\"query-input\":{\"@type\":\"PropertyValueSpecification\",\"valueRequired\":true,\"valueName\":\"search_term_string\"}}],\"inLanguage\":\"pl-PL\"},{\"@type\":\"Organization\",\"@id\":\"https:\\\/\\\/measline.com\\\/#organization\",\"name\":\"Measline\",\"url\":\"https:\\\/\\\/measline.com\\\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"pl-PL\",\"@id\":\"https:\\\/\\\/measline.com\\\/#\\\/schema\\\/logo\\\/image\\\/\",\"url\":\"https:\\\/\\\/measline.com\\\/wp-content\\\/uploads\\\/2021\\\/11\\\/logo_color_small.png.png\",\"contentUrl\":\"https:\\\/\\\/measline.com\\\/wp-content\\\/uploads\\\/2021\\\/11\\\/logo_color_small.png.png\",\"width\":1000,\"height\":417,\"caption\":\"Measline\"},\"image\":{\"@id\":\"https:\\\/\\\/measline.com\\\/#\\\/schema\\\/logo\\\/image\\\/\"}}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Compact sputtering system for surface metallization - Measline projects","description":"The sputtering system for surface metallization, consisting of three chambers enables the application of layers by thermal and ion sputtering.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/","og_locale":"pl_PL","og_type":"article","og_title":"Compact sputtering system for surface metallization - Measline projects","og_description":"The sputtering system for surface metallization, consisting of three chambers enables the application of layers by thermal and ion sputtering.","og_url":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/","og_site_name":"Measline","article_modified_time":"2025-12-02T09:35:14+00:00","og_image":[{"width":1039,"height":903,"url":"https:\/\/measline.com\/wp-content\/uploads\/2021\/12\/1-fragment-e1641221096880.jpg","type":"image\/jpeg"}],"twitter_card":"summary_large_image","twitter_misc":{"Szacowany czas czytania":"5 minut"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/","url":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/","name":"Compact sputtering system for surface metallization - Measline projects","isPartOf":{"@id":"https:\/\/measline.com\/#website"},"primaryImageOfPage":{"@id":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/#primaryimage"},"image":{"@id":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/#primaryimage"},"thumbnailUrl":"https:\/\/measline.com\/wp-content\/uploads\/2021\/12\/1-fragment-e1641221096880.jpg","datePublished":"2023-09-08T12:32:34+00:00","dateModified":"2025-12-02T09:35:14+00:00","description":"The sputtering system for surface metallization, consisting of three chambers enables the application of layers by thermal and ion sputtering.","breadcrumb":{"@id":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/#breadcrumb"},"inLanguage":"pl-PL","potentialAction":[{"@type":"ReadAction","target":["https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/"]}]},{"@type":"ImageObject","inLanguage":"pl-PL","@id":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/#primaryimage","url":"https:\/\/measline.com\/wp-content\/uploads\/2021\/12\/1-fragment-e1641221096880.jpg","contentUrl":"https:\/\/measline.com\/wp-content\/uploads\/2021\/12\/1-fragment-e1641221096880.jpg","width":1039,"height":903,"caption":"Kompaktowa napylarka do metalizacji powierzchni"},{"@type":"BreadcrumbList","@id":"https:\/\/measline.com\/index.php\/en-gb\/project\/compact-sputtering-system-for-surface-metallization\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Strona g\u0142\u00f3wna","item":"https:\/\/measline.com\/index.php\/pl\/"},{"@type":"ListItem","position":2,"name":"Projekty","item":"https:\/\/measline.com\/index.php\/project\/"},{"@type":"ListItem","position":3,"name":"Compact PVD and sputtering system for surface metallization\u00a0"}]},{"@type":"WebSite","@id":"https:\/\/measline.com\/#website","url":"https:\/\/measline.com\/","name":"Measline","description":"Advanced solutions","publisher":{"@id":"https:\/\/measline.com\/#organization"},"potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/measline.com\/?s={search_term_string}"},"query-input":{"@type":"PropertyValueSpecification","valueRequired":true,"valueName":"search_term_string"}}],"inLanguage":"pl-PL"},{"@type":"Organization","@id":"https:\/\/measline.com\/#organization","name":"Measline","url":"https:\/\/measline.com\/","logo":{"@type":"ImageObject","inLanguage":"pl-PL","@id":"https:\/\/measline.com\/#\/schema\/logo\/image\/","url":"https:\/\/measline.com\/wp-content\/uploads\/2021\/11\/logo_color_small.png.png","contentUrl":"https:\/\/measline.com\/wp-content\/uploads\/2021\/11\/logo_color_small.png.png","width":1000,"height":417,"caption":"Measline"},"image":{"@id":"https:\/\/measline.com\/#\/schema\/logo\/image\/"}}]}},"_links":{"self":[{"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/project\/4686","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/project"}],"about":[{"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/types\/project"}],"author":[{"embeddable":true,"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/comments?post=4686"}],"version-history":[{"count":17,"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/project\/4686\/revisions"}],"predecessor-version":[{"id":5983,"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/project\/4686\/revisions\/5983"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/media\/1480"}],"wp:attachment":[{"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/media?parent=4686"}],"wp:term":[{"taxonomy":"project_category","embeddable":true,"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/project_category?post=4686"},{"taxonomy":"project_tag","embeddable":true,"href":"https:\/\/measline.com\/index.php\/wp-json\/wp\/v2\/project_tag?post=4686"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}