[et_pb_section fb_built=”1″ _builder_version=”4.16″ _module_preset=”default” background_color=”rgba(0,0,0,0.05)” custom_margin=”0px|0px|0px|0px|false|false” custom_padding=”0px|0px|0px|0px|false|false” global_colors_info=”{}”][et_pb_row column_structure=”1_2,1_2″ _builder_version=”4.16″ _module_preset=”default” custom_margin=”0px||0px||true|false” custom_padding=”11px||3px||false|false” global_colors_info=”{}”][et_pb_column type=”1_2″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_button button_url=”@ET-DC@eyJkeW5hbWljIjp0cnVlLCJjb250ZW50IjoicG9zdF9saW5rX3VybF9wYWdlIiwic2V0dGluZ3MiOnsicG9zdF9pZCI6IjQ0MzkifX0=@” button_text=”Back to all projects” _builder_version=”4.22.1″ _dynamic_attributes=”button_url” _module_preset=”default” custom_button=”on” button_text_color=”#225500″ button_border_width=”0px” button_icon=”J||divi||400″ global_colors_info=”{}”][\/et_pb_button][\/et_pb_column][et_pb_column type=”1_2″ _builder_version=”4.17.0″ _module_preset=”default” global_colors_info=”{}”][et_pb_button button_url=”@ET-DC@eyJkeW5hbWljIjp0cnVlLCJjb250ZW50IjoicG9zdF9saW5rX3VybF9wYWdlIiwic2V0dGluZ3MiOnsicG9zdF9pZCI6IjQ1MTMifX0=@” button_text=”Thin layer deposition systems” _builder_version=”4.22.1″ _dynamic_attributes=”button_url” _module_preset=”default” custom_button=”on” button_text_color=”#225500″ button_border_width=”0px” button_icon=”J||divi||400″ global_colors_info=”{}”][\/et_pb_button][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_row column_structure=”1_2,1_2″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_column type=”1_2″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_image src=”https:\/\/measline.com\/wp-content\/uploads\/2023\/02\/20230202_131350_kadr.jpg” alt=”System magnetronowy do nanoszenia cienkich warstw” title_text=”Napylarka magnetronowa” _builder_version=”4.19.5″ _module_preset=”default” width=”76.5%” module_alignment=”center” custom_margin=”|||-64px||” custom_padding=”|||0px||” global_colors_info=”{}”][\/et_pb_image][\/et_pb_column][et_pb_column type=”1_2″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_text _builder_version=”4.22.1″ _module_preset=”default” global_colors_info=”{}”]<\/p>\n
[\/et_pb_text][et_pb_divider color=”#215500″ divider_weight=”2px” _builder_version=”4.16″ _module_preset=”default” custom_margin=”-23px||6px||false|false” global_colors_info=”{}”][\/et_pb_divider][et_pb_text _builder_version=”4.22.1″ _module_preset=”default” custom_padding=”2px||0px|||” global_colors_info=”{}”]<\/p>\n
The Magnetron system for coating deposition\u00a0is a device for sample surface metalization or depositing thin non-metallic layers using the ion sputtering method. The device is also equipped with a tool that allows the sample carrier to be transferred to the magnetron chamber using linear transfer<\/a>.<\/p>\n [\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”4.16″ _module_preset=”default” background_color=”rgba(0,0,0,0.05)” width=”100%” global_colors_info=”{}”][et_pb_row column_structure=”1_2,1_2″ admin_label=”Wiersz” _builder_version=”4.16.0″ _module_preset=”default” global_colors_info=”{}”][et_pb_column type=”1_2″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_text _builder_version=”4.22.1″ _module_preset=”default” custom_margin=”-50px||||false|false” custom_padding=”0px||3px||false|false” global_colors_info=”{}”]<\/p>\n Magnetron sources are placed at the bottom of the chamber, equipped with ports enabling a gas supply directly above the target<\/p>\n<\/li>\n Transferring the sample carrier from the loading chamber to the magnetron chamber using linear transfer<\/p>\n<\/li>\n The use of a loading chamber (lock) ensures small pressure fluctuations in the deposition chamber<\/p>\n<\/li>\n The sample holder allows the mask mounting to 50x50mm substrates, allowing the use of smaller substrates<\/p>\n<\/li>\n<\/ul>\n<\/div>\n [\/et_pb_text][\/et_pb_column][et_pb_column type=”1_2″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_video src=”https:\/\/measline.com\/wp-content\/uploads\/2022\/04\/System_magnetronowy_nowy.mp4″ _builder_version=”4.16.1″ _module_preset=”default” global_colors_info=”{}”][\/et_pb_video][et_pb_gallery gallery_ids=”3019,1535,1884,1887,3887,3847″ fullwidth=”on” _builder_version=”4.19.5″ _module_preset=”default” auto=”on” auto_speed=”5000″ hover_transition_duration=”400ms” global_colors_info=”{}”][\/et_pb_gallery][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”4.16″ _module_preset=”default” custom_padding=”30px||||false|false” global_colors_info=”{}”][et_pb_row _builder_version=”4.16″ _module_preset=”default” custom_padding=”0px||0px||false|false” global_colors_info=”{}”][et_pb_column type=”4_4″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_text _builder_version=”4.16.0″ _module_preset=”default” global_colors_info=”{}”]<\/p>\n Up to four magnetron sources<\/p>\n Designed for 1″ targets DC type for metallic targets<\/p>\n magnetrons adapted to RF power supplies for non-conductive targets<\/p>\n<\/td>\n<\/tr>\n 10\u02c9<\/span>\u2076 mbar within 2 hours of airing the chamber<\/p>\n<\/td>\n<\/tr>\n turbomolecular with a pumping rate >250 l\/s<\/p>\n dry primary pump with a pumping speed of not less than 5 m\u00b3\/h<\/p>\n<\/td>\n<\/tr>\n Two Pirani vacuum heads for measuring the initial vacuum<\/p>\n Penning or Bayard-Alpert vacuum head in the range of 10\u02c9\u00b2 mbar – 10\u02c9\u2079\u00a0mbar<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n [\/et_pb_text][\/et_pb_column][\/et_pb_row][et_pb_row _builder_version=”4.16″ _module_preset=”default” locked=”off” global_colors_info=”{}”][et_pb_column type=”4_4″ _builder_version=”4.16″ _module_preset=”default” global_colors_info=”{}”][et_pb_text _builder_version=”4.22.1″ _module_preset=”default” global_colors_info=”{}”]<\/p>\n <\/span><\/p>\n See also other thin-layer deposition systems:The most significant device features:<\/h3>\n<\/div>\n
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Specyfikacja:<\/h3>\n
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\n Source of the deposited material<\/td>\n \n
Possibility of replacement with magnetrons adapted to 2″ targets<\/p>\n<\/td>\n<\/tr>\n\n Magnetron power supply<\/span><\/td>\n \n \n Layer thickness control<\/td>\n quartz crystal microbalance<\/td>\n<\/tr>\n \n Temperatura pr\u00f3bek<\/td>\n od temperatury pokojowej do 400\u00b0C<\/td>\n<\/tr>\n \n Time to obtain vacuum<\/td>\n \n \n Pump system<\/td>\n \n \n Vacuum measurement<\/td>\n \n <\/ul>\n<\/div>\n
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Compact PVD system LPNW01<\/a> for thermal deposition of thin layers
PVDS 700 Coating deposition system<\/a> for layer deposition with the PVD technique
Compact PVD and sputtering system for surface metallization<\/a> with the possibility of thermal and magnetron deposition of layers.<\/p>\n