Vacuum chambers, equipment and components
We offer vacuum chambers and elements intended for vacuum systems, including magnetrons, thermal deposition devices, rotary transfer, and other vacuum accessories manufactured in Poland by MeasLine.
Vacuum chambers
Vacuum chambers tailored to customer requirements adapted to work in high and ultra-high vacuum conditions. Depending on the purpose, the chambers may have different sizes, wall thicknesses, and the size and number of ports. The chambers are manufactured in Poland by MeasLine.
Magnetrons
Magnetrons enable the deposition of thin layers using the PVD method from metallic (conductive) and ceramic targets, e.g., oxides. They are equipped with valves supplying working gas. They can be adjusted to targets of 1″, 2″, 3″, or 4″ diameters.
Thermal deposition devices
Devices designed for the deposition of monolayers and multilayers using the PVD technique based on evaporation by electron bombardment from a source in the form of a wire, rod, or crucible in a wide range of temperatures.
Magnetically coupled transfers
Modules intended for sample transfer, e.g., between the loading chamber and test chambers, deposition chambers, under vacuum conditions to avoid the influence of the atmosphere on the sample and the need to aerate the chambers each time the sample is replaced.
Linear and rotational transfers with magnetic coupling are available.
Sample Heating and Rotation Station
The sample heating and rotation station is designed to accommodate a sample holder that allows mounting of samples with maximum dimensions of 50×50 mm. It is equipped with a manually operated main shutter. Sample holder rotation is driven by a dedicated motor, ensuring smooth and consistent movement. The holder is compatible with linear transfer systems, enabling sample placement.
Probe Carrier
The carrier is designed for simultaneous thin film deposition on up to 10 AFM probes. It is fully compatible with the sample heating and rotation station. Continuous rotation during deposition ensures high uniformity of the deposited layers across all probes. The carrier is engineered for integration with a linear transfer mechanism, enabling controlled transfer to and from the load-lock chamber under vacuum conditions.
Butterfly Valve
Designed for use in vacuum systems equipped with magnetron sputtering sources. During sputtering, the process gas introduced into the chamber significantly increases the internal pressure, which can adversely affect the performance and longevity of the turbomolecular pump. Additionally, the continuous removal of process gas by the pumping system leads to excessive gas consumption.
The integration of a butterfly valve at the pump exhaust enables safe pump operation by reducing the pressure load on the turbopump and minimizing the loss of process gas during pumping. The valve also facilitates precise regulation of the chamber pressure during operation.
The valve can be motorized, with an option to disengage the drive and perform manual adjustment.
Elements for vacuum systems
- Flanges tye CF,KF, ISO-K
- Connector reducers CF,KF, ISO-K
- Seals for connectors CF,KF, ISO-K
- Pipes, connectors, elbows, pipe tees, four-pieces CF,KF, ISO-K
- Bellows and hoses CF,KF, ISO-K
- Reductions and adapters CF,KF, ISO-K
- Electric and gas bushings
